Ni–W–P electrodeposits were synthesized in a Hull cell in order to simulate the obtainment under industrial conditions. Complete coverage of panels was accomplished by applying total currents of 1.0 and 2.0 A. Panels obtained with a current of 1.0 A appeared brighter. The best compositional uniformities, as determined by Energy Dispersive Spectrometer (EDS) occurred in the current density ranges of 0.6 to 3.0 A dm−2 and 1.6 to 6.0 A dm−2 obtained with 1.0 and 2.0 A, respectively. However, the best morphological characteristics, as determined by Scanning Electro Microscope (SEM), were observed in those obtained with a total current of 1.0 A. Analysis of corrosion resistance by Electrochemical Impedance Spectroscopy (EIS) and Potentiodynamic Linear Polarization (PLP) in NaCl have shown significant variations in the amount of corrosion potential, polarization resistance, and even total impedance. The alloys exhibited amorphous character (XRD) and crystallized above 400 °C to Ni and Ni3P phases, and possibly Ni–W, with a subsequent increase in hardness. The results suggest that under industrial conditions, current density variations due to the large and complex geometric shapes of substrates lead to formation of distinct alloys. Furthermore, these materials are potential substitutes for chromium deposits in many applications.

Neste trabalho foi estudada a influência dos parâmetros operacionais de eletrodeposição na estrutura, na morfologia dos revestimentos de Cr e Ni-Cr-P e no comportamento eletroquímico destes em meio aquoso contendo cloreto. Todos os eletrodepósitos foram obtidos sobre cobre. As camadas de Cr foram obtidas a partir de um banho industrial. Os eletrodepósitos amorfos de Ni-Cr-P foram obtidos a 60 °C, no intervalo de 100 a 400 mA cm-2 e usando um banho de pH igual a 2 e contendo: 40 g L-1 de NiCl2.6H2O; 102 g L-1 de CrCl3; 14 g L-1 de NaPH2O2; 30 g L-1 de H3BO3; 15 g L-1 de NaBr; 50 g L-1 de NH4Cl, 80 g L-1 de Na3C6H5O7 .2H2O e 40 mL L-1 de HCOOH. Estas camadas foram obtidas com cargas de eletrodeposição de 500 e 1600 Coulombs A caracterização dos eletrodepósitos foi feita por Calorimetria de Varredura Diferencial (DSC), Difração de Raios X (XRD), Microscopia Eletrônica de Varredura (SEM) e Energia Dispersiva de Raios X (EDX). O comportamento eletroquímico foi avaliado por polarização potenciodinâmica em NaCl 0,1 mol L-1 e à temperatura ambiente. Não foi observada a presença de trincas nas camadas eletrodepositadas de Ni-Cr-P e a morfologia superficial foi caracterizada pela presença de nódulos esféricos. A cristalização das ligas de Ni-Cr-P ocorreu a 325 °C com a formação de fases de Ni e Ni3P. O eletrodepósito de cromo não apresentou trincas, mas todos os revestimentos de Cr que foram tratados termicamente apresentaram trincas distribuídas por toda a superfície e apresentaram diminuição na dureza e na resistência à corrosão. A dureza das camadas de Ni-Cr-P aumentou com a temperatura de tratamento térmico e este comportamento foi associado à presença da fase Ni3P. A morfologia nodular desapareceu durante o tratamento térmico e foi relacionada à difusão de Cr para a superfície. Dentre os vários eletrodepósitos de Ni-Cr-P estudados, a camada Ni66Cr12P22 foi a que apresentou melhor resistência à corrosão e com um potencial de corrosão ligeiramente superior ao apresentado pelo eletrodepósito de Cr. O revestimento Ni66Cr12P22 é um potencial candidato a substituir o revestimento de Cr industrial, principalmente sob condições operacionais em temperaturas superiores à ambiente.

Structural and morphological characteristics of the electrodeposited Cr and Ni-Cr-P coatings and their corresponding electrochemical behaviors in chloride aqueous medium were investigated here. All coatings were electrodeposited on copper. Cr coatings were obtained from an industrial plating solution and amorphous Ni-Cr-P coatings were successfully obtained at 60ºC in the range of 100 to 400 mA cm-2, using a plating solution at pH 2 containing 40 g L-1 NiCl2.6H2O; 102 g L-1 CrCl3; 14 g L-1 NaPH2O2; 30 g L-1 H3BO3; 15 g L-1 NaBr; 50 g L-1 NH4Cl, 80 g L-1 Na3C6H5O7 .2H2O and 40 mL L-1 HCOOH. The coatings were obtained using constant charges of 500 and 1600 Coulombs. The characterization of the coatings was carried out by Scanning Electron Microscopy (SEM), X-ray Diffraction (XRD), Differential Scanning Calorimetry (DSC) and Energy Dispersive X-ray Analysis (EDX) techniques. The electrochemical behavior of both coatings was evaluated by potentiodynamic polarization curves, at room temperature, in 0.1 mol L-1 NaCl aqueous solution. It was not observed cracks on the electrodeposited Ni-Cr-P coatings and the surface morphology was characterized by the presence of spherical nodules. The crystallization of these coatings occurred at 325 °C with the formation of Ni and Ni3P phases. All the annealed Cr coatings showed cracked surfaces. The presence of cracks impairs the mechanical and corrosion resistance properties of Cr coatings. The hardness of the Ni-Cr-P was increased with the increase of the annealing temperature. Spherical noodles were absent in the surface of as-annealed Ni-Cr-P coating which it was associated with the diffusion of Cr to the surface and cracks were not observed in any annealing temperature. Among the various electrodeposited Ni-Cr-P coatings studied here, the Ni66Cr12P22 coating presented the best corrosion behavior and it is a potential candidate to substitute Cr in industrial application, mainly at operational temperatures that exceed room temperature.

A systematic electrochemical study of a novel cyanide free galvanic plating solution of alkaline zinc is presented. Cell Hull tests and potentiodynamic linear polarization measurements were carried out to evaluate the influence of operational parameters, such as concentration, current efficiency and degradation of additives. The stability of the bath was assessed by a long term test during 40 h at 200 A m-2. The morphology of the coatings was characterized by scanning electron microscopy. The results showed good performance of the plating solution. The cost is similar to that of the commercial cyanide bath and lower than that of the commercial cyanide free bath.